Jan Pomplun - Gast
Zuse-Institut Berlin (ZIB)
Bereich Numerische Mathematik
Abteilung Numerische Analysis und Modellierung
Takustr. 7
D-14195 Berlin-Dahlem
Germany
Email: pomplun
zib.de
Telefon: +49 30 84185-273
Fax: +49 30 84185-107
Raum: 4155
Bereich Numerische Mathematik
Abteilung Numerische Analysis und Modellierung
Takustr. 7
D-14195 Berlin-Dahlem
Germany
Email: pomplun
zib.deTelefon: +49 30 84185-273
Fax: +49 30 84185-107
Raum: 4155
Publikationen
2013 |
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| S. Burger, L. Zschiedrich, J. Pomplun, M. Blome, F. Schmidt | Advanced finite-element methods for design and analysis of nano-optical structures: Applications | Proc. SPIE, Vol. 8642, p. 864205, 2013 | DOI BibTex | RIS |
| C. Arellano, S. Mingaleev, I. Koltchanov, A. Richter, J. Pomplun, S. Burger, F. Schmidt | Efficient design of photonic integrated circuits (PICs) by combining device- and circuit- level simulation tools | Proc. SPIE, Vol. 8627, p. 862711, 2013 | DOI BibTex | RIS |
| S. Burger, L. Zschiedrich, J. Pomplun, F. Schmidt, B. Bodermann | Fast simulation method for parameter reconstruction in optical metrology | Proc. SPIE, Vol. 8681, p. 868119, 2013 | DOI BibTex | RIS |
| J. K. Tyminski, J. Pomplun, L. Zschiedrich, D. Flagello, T. Matsuyama | Topographic mask modeling with reduced basis finite element method | Proc. SPIE, Vol. 8683, p. 86831C, 2013 | DOI BibTex | RIS |
2012 |
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| M. Rozova, J. Pomplun, L. Zschiedrich, F. Schmidt, S. Burger | 3D finite element simulation of optical modes in VCSELs | Physics and Simulation of Optoelectronic Devices XX, B. Witzigmann, M. Osinski, F. Henneberger, Y. Arakawa (Eds.), Vol. 8255, p. 82550K, Proc. SPIE, 2012 | DOI BibTex | RIS |
| L. Zschiedrich, H. Greiner, J. Pomplun, M. Hammerschmidt, S. Burger, F. Schmidt | FEM simulations of light extraction from nanostructured organic light-emitting diodes | Renewable Energy and the Environment Optics and Photonics Congress, Renewable Energy and the Environment Optics and Photonics Congress, p. LT2B.5, Optical Society of America, 2012 | BibTex | RIS |
| S. Burger, J. Pomplun, F. Schmidt | Finite Element Methods for Computational Nano-optics | Encyclopedia of Nanotechnology, B. Bhushan (Ed.), pp. 837-843, Springer Netherlands, 2012 | DOI BibTex | RIS |
| J. K. Tyminski, R. Popescu, S. Burger, J. Pomplun, L. Zschiedrich, T. Matsuyama, T. Noda | Finite element models of lithographic mask topography | Optical Microlithography XXV, W. Conley (Ed.), Vol. 8326, p. 83261B, Proc. SPIE, 2012 | DOI BibTex | RIS |
| J. Pomplun, H. Wenzel, S. Burger, L. Zschiedrich, M. Rozova, F. Schmidt, P. Crump, H. Ekhteraei, C. M. Schultz, G. Erbert | Thermo-optical simulation of high-power diode lasers | Physics and Simulation of Optoelectronic Devices XX, Bernd Witzigmann, Marek Osinski, Fritz Henneberger, Yasuhiko Arakawa (Eds.), Vol. 8255, p. 825510, Proc. SPIE, 2012 | DOI BibTex | RIS |
2011 |
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| B. H. Kleemann, J. Kurz, J. Hetzler, J. Pomplun, S. Burger, L. Zschiedrich, F. Schmidt | Fast online inverse scattering with Reduced Basis Method (RBM) for a 3D phase grating with specific line roughness | Modelling Aspects in Optical Metrology III, B. Bodermann (Ed.), Vol. 8083, p. 808309, Proc. SPIE, 2011 | DOI BibTex | RIS |
| F. Schmidt, J. Pomplun, L. Zschiedrich, S. Burger | Fast online simulation of 3D nanophotonic structures by the reduced basis method | Integrated Optics: Devices, Materials, and Technologies XV, Vol. 7941, p. 79410G, Proc. SPIE, 2011 | DOI BibTex | RIS |
| S. Burger, J. Pomplun, F. Schmidt, L. Zschiedrich | Finite-element method simulations of high-Q nanocavities with 1D photonic bandgap | Physics and Simulation of Optoelectronic Devices XIX, Vol. 7933, p. 79330T, Proc. SPIE, 2011 | DOI BibTex | RIS |
| S. Burger, L. Zschiedrich, J. Pomplun, F. Schmidt, A. Kato, C. Laubis, F. Scholze | Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations | Photomask Technology 2011, W. Maurer, F. E. Abboud (Eds.), Vol. 8166, p. 81661Q, Proc. SPIE, 2011 | DOI BibTex | RIS |
| J. Pomplun, S. Burger, L. Zschiedrich, F. Schmidt | Reduced basis method for real-time inverse scatterometry | Modelling Aspects in Optical Metrology III, B. Bodermann (Ed.), Vol. 8083, p. 808308, Proc. SPIE, 2011 | DOI BibTex | RIS |
| S. Burger, L. Zschiedrich, J. Pomplun, F. Schmidt | Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks | Modelling Aspects in Optical Metrology III, B. Bodermann (Ed.), Vol. 8083, p. 80831B, Proc. SPIE, 2011 | DOI BibTex | RIS |
2010 |
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| J. Pomplun, F. Schmidt | Accelerated a posteriori error estimation for the reduced basis method with application to 3D electromagnetic scattering problems | SIAM J. Sci. Comput., Vol. 32, pp. 498-520, 2010 | BibTex | RIS |
| J. Pomplun, F. Schmidt, S. Burger, L. Zschiedrich | Adaptive Reduced Basis Method for Optical Scattering Problems | Integrated Photonics Research, Silicon and Nanophotonics, p. IWD4, OSA, 2010 | BibTex | RIS |
| S. Burger, L. Zschiedrich, J. Pomplun, F. Schmidt | Finite element method for accurate 3D simulation of plasmonic waveguides | Integrated Optics: Devices, Materials, and Technologies XIV, Vol. 7604, p. 76040F, Proc. SPIE, 2010 | DOI BibTex | RIS |
| J. Pomplun, S. Burger, F. Schmidt, A. Schliwa, D. Bimberg, A. Pietrzak, H. Wenzel, G. Erbert | Finite element simulation of the optical modes of semiconductor lasers | phys. stat. sol. (b), Vol. 247, pp. 846-853, 2010 | DOI BibTex | RIS |
| J. Pomplun, F. Schmidt | Reduced Basis Method for Electromagnetic Field Computations | Scientific Computing in Electrical Engineering SCEE 2008, p. 85, Springer Berlin Heidelberg, 2010 | DOI BibTex | RIS |
| J. Pomplun, L. Zschiedrich, S. Burger, F. Schmidt, J. Tyminski, D. Flagello, N. Toshiharu | Reduced basis method for source mask optimization | Photomask Technology, Vol. 7823, p. 78230E, Proc. SPIE, 2010 | DOI BibTex | RIS |
2009 |
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| S. Burger, L. Zschiedrich, J. Pomplun, F. Schmidt, B. Kettner, D. Lockau | 3D Finite-Element Simulations of Enhanced Light Transmission Through Arrays of Holes in Metal Films | Numerical Methods in Optical Metrology, Vol. 7390, p. 73900H, Proc. SPIE, 2009 | DOI BibTex | RIS |
| J. Pomplun, L. Zschiedrich, S. Burger, F. Schmidt | Reduced basis method for computational lithography | Photomask Technology, Vol. 7488, p. 74882B, Proc. SPIE, 2009 | DOI BibTex | RIS |
| J. Pomplun, F. Schmidt | Reduced basis method for fast and robust simulation of electromagnetic scattering problems | Numerical Methods in Optical Metrology, Vol. 7390, Proc. SPIE, 2009 | BibTex | RIS |
2008 |
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| F. Schmidt, S. Burger, J. Pomplun, L. Zschiedrich | Advanced FEM analysis of optical waveguides: algorithms and applications | Integrated Optics: Devices, Materials, and Technologies XII, Christoph M. Greiner, Christoph A. Wächter (Eds.), Vol. 6896, 2008 | BibTex | RIS |
| F. Scholze, Laubis C., G. Ulm, U Dersch, J Pomplun, S Burger, F. Schmidt | Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation | Emerging Lithographic Technologies XII, Frank M. Schellenberg (Ed.), Vol. 6921, 2008 | BibTex | RIS |
| S. Burger, L. Zschiedrich, J. Pomplun, F. Schmidt | JCMsuite: An Adaptive FEM Solver for Precise Simulations in Nano-Optics | Integrated Photonics and Nanophotonics Research and Applications, Integrated Photonics and Nanophotonics Research and Applications, p. ITuE4, Optical Society of America, 2008 | BibTex | RIS |
| J Pomplun, S. Burger, F Schmidt, F Scholze, C. Laubis, U. Dersch | Metrology of EUV masks by EUV-scatterometry and finite element analysis | Photomask and Next-Generation Lithography Mask Technology XV, Toshiyuki Horiuchi (Ed.), Vol. 7028, 2008 | BibTex | RIS |
| J. Pomplun, F. Schmidt | Reduced Basis Method for Nano Optical Simulations | Integrated Photonics and Nanophotonics Research and Applications, Integrated Photonics and Nanophotonics Research and Applications, p. IWD7, Optical Society of America, 2008 | BibTex | RIS |
2007 |
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| J. Pomplun, S. Burger, L. Zschiedrich, F. Schmidt | Adaptive finite element method for simulation of optical nano structures | phys. stat. sol. (b), Vol. 244, pp. 3419-3434, 2007 | DOI BibTex | RIS |
| J. Pomplun, R. Holzlöhner, S. Burger, L. Zschiedrich, F. Schmidt | FEM investigation of leaky modes in hollow core photonic crystal fibers | Proc. SPIE, Photonic Crystal Materials and Devices VI, S.-Y. Lin A. Adibi, A. Scherer (Eds.), Vol. 6480, p. 64800M, 2007 | BibTex | RIS |
| J. Pomplun, S. Burger, F. Schmidt, F. Scholze, C. Laubis, U. Dersch | Finite element analysis of EUV lithography | Modeling Aspects in Optical Metrology, H. Bosse (Ed.), Vol. 6617, p. 661718, Proc. SPIE, 2007 | BibTex | RIS |
| J. Pomplun, L. Zschiedrich, R. Klose, F. Schmidt, S. Burger | Finite element simulation of radiation losses in photonic crystal fibers | phys. stat. sol. (a), Vol. 204, No. 11, pp. 3822-3837, 2007 | DOI BibTex | RIS |
| L. Zschiedrich, S. Burger, J. Pomplun, F. Schmidt | Goal oriented adaptive finite element method for precise simulation of optical components | Proc. SPIE, Integrated Optics: Devices, Materials, and Technologies XI, Y. Sidorin, Ch. A. Waechter (Eds.), Vol. 6475, p. 64750H, 2007 | BibTex | RIS |
| F. Scholze, C. Laubis, U. Dersch, J. Pomplun, S. Burger, F. Schmidt | The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks | Modeling Aspects in Optical Metrology, H. Bosse (Ed.), Vol. 6617, p. 66171A, Proc. SPIE, 2007 | BibTex | RIS |
2006 |
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| S. Burger, L. Zschiedrich, A. Schädle, R. Klose, B. Kettner, J. Pomplun, T. Pollok, F. Schmidt | Advanced FEM Analysis of Nano-Optical Devices | Proc. Symposium on Photonics Technologies for the 7th Framework Programme, 2006 | BibTex | RIS |
| R. Holzlöhner, S. Burger, P. J. Roberts, J. Pomplun | Efficient optimization of hollow-core photonic crystal fiber design using the finite-element method | J. Europ. Opt. Soc: Rap. Comm., Vol. 1, p. 06011, 2006 | BibTex | RIS |
| J. Pomplun, S. Burger, F. Schmidt, L. Zschiedrich, F. Scholze | Rigorous FEM-Simulation of EUV-Masks: Influence of Shape and Material Parameters | Photomask Technology, P. M. Martin, R. J. Naber (Eds.), Vol. 6349, p. 63493D, Proc. SPIE, 2006 | BibTex | RIS |
| J. Pomplun | Rigorous FEM-Simulation of Maxwell's Equations for EUV-Lithography | Diploma thesis, Technische Universität Berlin 2006 | PDF BibTex | RIS |