Phase Masks

Design of phase masks in memory production

Description

We investigate numerical methods for the simulation of light scattering off 2D and 3D DUV photolithographic masks. This includes the adaption of the software package JCMharmony to these simulation tasks.

Further information is available in the detailed project description.

 
Members

Sven Burger
Roland Klose
Achim Schädle
Frank Schmidt
Lin Zschiedrich

Responsible

Frank Schmidt

Partners 

• Infineon Technologies AG
• JCMwave GmbH

Funding

Infineon Technologies AG
JCMwave GmbH

Duration

est. 07/2005 - 06/2007