Design of phase masks in memory production
We investigate numerical methods for the simulation of light scattering off 2D and 3D DUV photolithographic masks. This includes the adaption of the software package JCMharmony to these simulation tasks.
Further information is available in the detailed project description.
- Infineon Technologies AG
- JCMwave GmbH
Infineon Technologies AG
est. 07/2005 - 06/2007