Photolithography
Design and optimization of algorithms for photolithography
Description
We investigate numerical methods for the simulation of light scattering off 2D and 3D DUV photolithographic masks. This includes the adaption of the software package JCMharmony to these simulation tasks.
Further information is available in the detailed project description.
Members
Sven Burger
Achim Schädle
Frank Schmidt
Lin Zschiedrich
Responsible
Partners
Funding
Duration
est. 11/2007 - 12/2008
- further information
Photolithography - 01.11.2007 00:00